Next Generation Filters for Defect Control in Microelectronics

Date Published 2023 | Conference material

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This work focusses on the development of advanced filtration solutions with targeted metal, organics and particulate removal/retention from aqueous solvent used in the Wet-Etch and Cleans module in the semiconductor industry.

Organizations: Pall
Authors: Varun Vakharia,
Tags: FiltrationHigh Purity Chemicals

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