Case studies on semiconductor ultrapure water and wastewater reclamation using the latest generation of RO Membranes

Date Published 2023 | Conference material

Log in or Join UPM to access this content

To access our resources you will need to be a member of UPM, log in to your account or purchase a membership to view this content

Already have an account? Log in

In the semiconductor manufacturing process, a large amount of ultrapure water (UPW) is used in the cleaning operations performed before and after each process. In order to alleviate the shortage of limited water resources, the recovery and reuse of wastewater has been attracting attention.

Authors: Ishihara Satoru, Tomi Yasuhiro, David Shin,
Tags: SemiconductorsWastewater ReclaimRO technologiesReverse osmosis

Related content

UPW journal archive | 2016
How Can Preventative Maintenance of Filters Ensure the Highest Quality of UPW at Lowest Cost of Ownership?
Conference material | 2023
Advancements in PTR-TOF Technology for Improved Real-Time AMC Monitoring
Conference material | 2023
High Purity Environments - Opening Panel 2023
Conference material | 2023
Determination of trace level organic contamination leached from HDPE containers used for semiconductor solvents and recovery and identification of organic residues on wafer surfaces using these contaminated solvents
Conference material | 2023
Digitized MLD and ZLD: Optimizing Through Modularization of Membrane and Thermal Systems
Conference material | 2023
PFAS Analysis in UPW and Process Water

Back to results

Not a UPM Member?

Be part of year-round collaboration and knowledge exchange. Get access to the full range of tools leveraged by facility representatives and leading global experts from across the supply chain.

Book a demo

Find out how you can leverage UPM Member Portal to achieve your business objectives today.

Request a demo