Can advanced oxidation technology help control TOC in semiconductor water?

Date Published 2017 | UPW journal archive

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This article will discuss typical organic removal methods commonly applied in a semiconductor ultrapure water (UPW*) system and new methods for improving the removal of organic contaminants from the critical process water. An equipment manufacturer has developed an advanced oxidation processes that specifically addresses total organic carbon (TOC) levels, to reduce them to sub-part-per-billion (ppb) levels. This has been shown to have significant benefits in the integrated chip (IC) manufacturing process

Tags: Total Organic Carbon (TOC)Advanced OxidationUPW

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