The UPM 2023 Annual Conference in San Marcos, Texas, from October 10th to 12th, was a sell-out success, drawing 500+ attendees from across the microelectronics value chain, to connect, collaborate, and share the solutions needed to advance progress towards the conference theme, Unlocking Facility 2.0.

Laser-focused on end-user needs, the 2023 agenda addressed rapidly evolving operational challenges. With 14% of all attendance being made up off end-user representatives, the conference remains one of the most important yearly touch points between these facility engineers and the wider supply chain.

What is the focus of the UPM 2023 technical presentations hosted on the Technical Knowledge Base?

The industry is still rapidly growing – both in scale and in complexity. Manufacturers need to meet their sustainability goals whilst producing more chips and operating at higher quality parameters. Facilities must be at the forefront of industry attention – and facilities need new-age solutions. The UPM 2023 Conference brought together innovators and thought leaders in these areas, so experts could learn from each other. With these presentations now online, you have the chance to learn from them too.

UPM 2023 Annual Conference - Technical Presentations Now Available

The presentation slides from the 2023 annual conference are now available, log in or set up your account to get access! We’ll be following up with the video recordings shortly, you should receive email notification when these are available.

The semiconductor industry has also successfully employed various degrees of offsite manufacturing (OSM) over the years, but the need for enhanced or optimal OSM within the industry has never been stronger. This presentation will share lessons learned from several Semiconductor UPW and WW treatment projects with enhanced OSM, and provide guidance on how to incorporate a successful OSM strategy into a project execution plan

Modular OSM Constructs for Improved Cost,  Schedule, EHS & Environmental Benefit

Ozonated water is generated by a sub-unit, where unused Ozonated water get purged out to waste to keep concentration stable in which accounted for 90% of DIW going thought the ozone generator unit. By developing a ozonated water reclaim unit, we are able to recycle the unused ozonated water and resupply it back to the generator unit. By doing so, the project may reduce the unused ozonated water waste to 0 and estimate to save more than 5 billion gallons of water by 2030 as it is proliferated throughout the Intel fleet.

Ozonated Water Reclaim on SCREEN Wet Tools

Due to the global increase of decarbonization, the demand of energy consumption reduction on ultrapure water producing systems in semiconductor fab has been increased. Kurita Water Industries has developed new system control technology for contributing the energy consumption reduction.

Optimization of the primary pure water system configuration and new operational control for enabling minimal energy consumption on ultrapure water producing systems

Sub-20 nm nanoparticles in ultrapure water are known to be potential contaminants of semiconductors, thereby limiting the production yield. It is therefore essential to identify their sources and to measure their concentration and size in order to take appropriate measures for their removal. Traditional light-scattering technology has a low signal-to-noise ratio. This presentation presents a novel metrology based on acoustic counting to tackle these challenges.

A novel nanoparticle counter for UPW based on acoustic cavitation

Reverse Osmosis practices were not optimized for sustainability at major plants.​ This presentation showcases several recommendations, including reuse of RO membranes and reduction of chemical use.​

Suggestions of eco-friendly RO membrane operation (Focused on K-water’s RO plant )

How will GAA and other semiconductor developments affect those working in the sustainability field?

Where are facilities focusing their efforts in offsetting their footprints?

How do facilities manage trade-offs and difficult decisions relating to sustainability?

Environmental Sustainability - Opening Panel

Airborne Molecular Contamination (AMC) is a major concern in clean production environments, including the semiconductor, pharmaceutical, and aerospace industries. In this study, the presenter highlights the benefits of real-time AMC monitoring solutions utilizing PTR-TOF technology and present recent advancements for this specific application.

Advancements in PTR-TOF Technology for Improved Real-Time AMC Monitoring

In this study, nano-sized fluorescent molecules were employed as surrogate nano-contaminants. By continuously monitoring the rejection efficiency of these fluorescent molecules, breaches in the RO system could be detected in real-time. The highly charged fluorescent molecules can be easly removed by ion exchange in polishing steps.

Use of Fluorescent Molecules as Surrogate Nanocontaminants to Monitor the Integrity of Reverse Osmosis Membranes in Ultrapure Water Systems

Requirements for UPW quality are still moving towards lower particle counts in smaller dimensions, but also in terms of molecular components – specifically organic substances – are in focus.

Impact of H2O2 Concentration in UPW on (Ultra) Filters Performance

What are the key challenges for contamination control in liquids and gases?

How can we ensure purity of liquids and gases from point of creation to point of use?

How can we control contamination when metrology cannot keep up with the demands of new semiconductor technology? 

High Purity Environments - Opening Panel 2023

Semiconductor manufacturing involves hundreds of independent processes. To ensure acceptable quality in high-throughput production environments, it is crucial that the monitoring for airborne molecular contaminants is done sensitively and comprehensively, including a diversity of known and unknown contaminants. Chemical ionization time-of-flight (CI-TOF) mass spectrometry allows for monitoring a customized compound list.

Online Monitoring of Traditional and Emerging Airborne Molecular Contaminants at pptv Concentrations

When faced with a hydrofluoric acid treatment capacity crunch, GlobalFoundries Fab 8 committed to the future by installing a state-of-the-art fluoride concentrator: Hydrofluoric Acid Reverse Osmosis, or HFRO. The system allows the company to dramatically decrease the volume of fluoride sent for treatment while producing valuable RO permeate that is used to feed gas abatements.

HFRO: A Capacity Crunch Paves the Road to Future  Development

The paper will present KPIs and calculation methods to quantify environmental impact with regard to water treatment systems. Some of them are targeted on assessing the overall water management concept, others will be used to assess individual parts.

Energy and water use efficiency considerations in ultrapure and wastewater system design and  operation for semiconductor fabs

In this study, we develop the technique of using a liquid particle counter to measure the retention of polymer membrane filters and apply that technique to two use cases. In the first use case, we look at the performance of two membranes in 30% hydrogen peroxide and compare the results with the retention performance measured by single nanoparticle ICP-MS and the more traditional standardized particle techniques. In the second use case, we investigate several different polymer membranes in hydrochloric acid and study the impact of pore size and surface modification on the native particle removal efficiency and compare this with traditional techniques. These two use cases demonstrate the utility of this technique and its ability to provide insight into the performance of polymer membrane filters where existing methods do not.

Predicting Filtration Performance Using Native Particles

In the semiconductor manufacturing process, a large amount of ultrapure water (UPW) is used in the cleaning operations performed before and after each process. In order to alleviate the shortage of limited water resources, the recovery and reuse of wastewater has been attracting attention.

Case studies on semiconductor ultrapure water and wastewater reclamation using the latest generation of RO Membranes

In recent years, the semiconductor industry has tightened its requirements for ultrapure water (UPW) quality, demanding extremely low levels of impurities at the point of use. The presented work describes a novel method for predicting the amount of H2O2 in UPW as a function of flowrate, UV system power level, and background peroxide concentration

Predicting Hydrogen Peroxide concentration for effective control in Ultrapure Water

This work focusses on the development of advanced filtration solutions with targeted metal, organics and particulate removal/retention from aqueous solvent used in the Wet-Etch and Cleans module in the semiconductor industry.


Next Generation Filters for Defect Control in Microelectronics

Particle precursors, defined as a dissolved molecular compound, which may form particles when dried on the wafer surface, have been identified in multiple studies as a risk to semiconductor manufacturing yield. The purpose of this paper is to demonstrate the utility of the Guide for Evaluation of Metrology for Particle Precursors in Ultrapure Water by evaluating multiple instruments at multiple facilities following the guidelines and comparing outcomes.

Application of a New SEMI F121 Guide for Evaluating Particle Precursor Metrology

This study draws parallels between the semiconductor and refinery industries, both high-energy consumers, to highlight the importance of energy management and its role in mitigating environmental impact through reduced water consumption and chemical usage in cooling tower systems.

Water and Energy Nexus: Resolving Conservation Challenges in the Refinery Industry and Its Relevance to the Semiconductor Sector

Organic contamination present in Ultrapure Water (UPW) poses a risk of depositing on the wafer surface during processing and cleaning. This new account of organics in UPW is important because it will enable better monitoring and improved control of potential particle formation on wafers. SEMI UPW TF particle precursor challenge evaluated sub-15nm filters and show the particle formation pathways.

Identification and Management of Potential Particle Precursors from Mixed Bed Ion Exchange

Experimental work showing leaching of contaminants from containers + impact on wafer.​ Sensitive analytical techniques can detect trace organic contaminants in semiconductor solvents with detection limits of low parts per trillion. These techniques can be implemented in online analytical systems which will enable the continuous monitoring of solvents prior to their use in the fabrication process. Controlling HMWO in solvents is becoming increasingly critical – can be precursors.​ 

Determination of trace level organic contamination leached from HDPE containers used for semiconductor solvents and recovery  and identification of organic residues on wafer surfaces using these contaminated solvents

Advanced water solutions and new project delivery models are needed to meet more aggressive water treatment targets and scheduling and staffing requirements. The authors will present real examples of modular digitalized systems that enable the above. This will allow the audience to think through and critique the pathway, while also considering if adjustments to status quo delivery models warrant consideration.

Digitized MLD and ZLD: Optimizing Through Modularization of Membrane and Thermal Systems

This presentation attempts to highlight examples where technology and innovation is enabling design teams to react more quickly to design changes. Traditional design flows are inefficient – poorly defined scope, no data centricity, poor change management. ​BIM software and other design tools shorten the design change lifecycle.​

Leveraging Data Driven Workflows to Shorten the Design Change Cycle

A lack of automated and streamlined measurement methods for PFAS means that there is little understanding about the quantities of PFAS in semiconductor water. Novel chromatography techniques can improve visibility over this contaminant in water.

PFAS Analysis in UPW and Process Water

This presentation discusses electrochemical systems for targeted metals removal from process and wastewater streams. This system uses an automated process to treat CuCMP rinse/wastewater by removing and recovering Cu as high purity metal sheets while achieving sub-ppm levels of Cu in the wastewater. 

Building A More Sustainable CuCMP Process Selective Copper Removal & Recovery

Experimental work dissolving different HMWOs in UPW and showing impact on wafer surface using cutting-edge SEPS and SERS analytical technology.

A study on the defectivity of particle precursors using surface enhanced particle sizing

Particle Measuring Systems has addressed the need for enhanced matching between particle counters and will present state of the art performance data based.


Advancing process control based on enhanced particle counter matching at the 20nm level

STMicroelectronics, set to double its production capacity, seeks to reclaim wastewater to feed UPW lines (end-of-pipe wastewater reclamation plant), because of the local municipalities' limitation to extract more freshwater. A water recycling/reclaim strategy has been implemented to meet future water withdrawal needs.

Case study preliminary technical assessment for wastewater reclamation to feed UPW lines

The manufacturing of microelectronics generates complex wastewaters that is unique to this industry. Gradiant recently built a 400m3/h LSR water recycling plant that plant included innovations to maximize recovery and efficiencies such as membrane recovery of UF backwash wastewater recovery, elimination of IX softening, RO design as semi-batch and SmartOps digital AI platform.

A Paradigm Shift with Wastewater Recycling Operations using Artificial Intelligence

The paper will describe steps taken with existing fab customers to review and prioritize streams for reuse within the fab, as part of ESG guidelines, water savings initiatives, to meet tightening municipal discharge limits, or State/Federal government initiatives.

Developing Water Reclaim Solutions for Existing Fabs

K-water has installed a new UPW facility for Wafer (semiconductor raw material) manufacturing with100m3/hr capacity. During the trial there were more than 50 issues, but they were solved. This presentation shares and discusses these issues.

Trouble Shooting List during a trial run in a new UPW system

Complexity, cost and inefficiency in fab construction. Starting commissioning early in project minimizes cost and delays. ​

Time To Market for Commissioning

Many semiconductor manufacturers have set ESG goals with a focus on reducing water consumption and eliminating hazardous substances in waste water. This presentation discusses the balance between zero liquid discharge (ZLD) and other environmental parameters.


Enabling ESG Goals via Sustainable Zero Liquid Discharge

Semiconductor fabs generate CMP wastewater containing azoles, organics (such as isopropyl alcohol), inorganics (such as ammonia), hydrogen peroxide, and other chemical components. A novel chemical agent reacts with azoles and produce a suspended solid that can be easily removed via settling or filtration. This presentation will discuss the existing oxidation-based methods of azoles removal as well as the novel process, and then compare the pros and cons of each option based on a set of possible design cases.

Azoles removal from CMP wastewater – Oxidation vs Novel Complexation Method

The construction industry is constantly looking for ways to build "better, faster, cheaper". Smart P&IDs are a step up from traditional P&IDs, adding computer-based intelligence into the design process.

Intelligent P&IDs: Building & Operating More Efficiently

This presentation will demonstrate scientific selection approach, results and supporting data for sustainable water recycling and quality parameters for feeding back to UPW make-up for silicon carbide manufacturing.

Systematic Process Technology Selection for treating SiC containing Waste Water

PCW captures heat from the manufacturing process and expels it to the environment via several heat-exchange steps (e.g., chilled water, condenser water, cooling tower). Proper PCW management is essential to the reliability of several key manufacturing processes and facility support operations such as direct tool cooling. However, PCW management requires cooperation and collaboration between three main parties: facilities, process owners and water treatment service suppliers.

Process Cooling Water (PCW) Reliability Improvement

The semiconductor industry is facing a challenge of rapid growth while also having to adapt to meet corporate Environmental, Social, and Governance (ESG) goals and increasingly stringent quality needs to enable future device technology. At the same time, supply chain issues and tightening budgets have added difficulty to an already extensive procurement process for water technologies. To enable solutions to these challenges and to unlock “Facility 2.0,” a different approach is needed.

Accelerating Water Technology Innovation in the Semiconductor Industry and Beyond

There is a significant challenge in implementing new technology for meeting ESG goals at existing facilities. Digital twin technology aids decision-making based on local context, and helps to improve reuse/recycle rates. 

Unlocking Opportunities for Reaching Sustainability Goals for Existing and New Fabs

Per- and polyfluoroalkyl substances (PFASs) are frequently used in the production of semiconductors resulting in the detection of PFAS in semiconductor wastewater.This study reports on a field demonstration of a pilot-scale hybrid membrane and UV-sulfite treatment train for the combined separation and destruction of 12 PFAS in groundwater. The technique destroys PFAS uses only widely commercially available equipment.

Not-So-Forever Chemicals: Field Demonstration of PFAS Destruction by a Pilot-Scale Nanofiltration and UV-Sulfite Treatment Train

In ultrapure water (UPW), nanoparticles (NP) are seen as contamination, as they can cause defects in semiconductor production. The goal of this study is to gain further knowledge about the interaction between NPs and resin systems by carrying out flow-through experiments using different NPs and resin types and studying the capacity of the resins to remove NPs.

Interaction of Nanoparticles with Ion Exchange Resin Beds in UPW polish systems

What is the fate of contaminants that are known to be in PVDF pipe when used in the ambient (22oC) UPW system? Analysis of long-term installed PVDF Piping using metals, anions, and TOC analysis

Fate of Contaminants in PVDF for Ambient UPW

Treatment plants must maintain strict operating limits of incoming waste influents in order to maintain healthy environments for biological treatment activities. This presentation will present some general case studies and other guidelines in how waste treatment engineers can navigate this issue more effectively.

Chemical Inhibitors to Biological Wastewater  Treatment - Impact Analysis and Management  Considerations for Facility Design

What is the right approach to offsite manufacturing, and how is critical for supporting the industry’s construction needs?

Why does the semiconductor industry so urgently need a digital transformation?

How can the supply chain react and collaborate to help ramp up semiconductor facilities faster and at a high quality?

Facilities Growth - Opening Panel 2023

The UPM conference is laser-focused on end-user needs, delivering critical discussions on facility growth, environmental sustainability, and stringent yield and reliability needs. As microelectronics facilities evolve rapidly, our agenda develops to address solutions.

The conference will foster the most relevant conversations for facilities. The industry is growing – both in scale and in complexity. Manufacturers need to meet their sustainability goals whilst producing more chips and operating at higher quality parameters. Facilities must be at the forefront of industry attention – and facilities need new-age solutions. The UPM 2023 Conference will bring together even more innovators and thought leaders in these areas, so experts can learn from each other.

UPM 2023 Annual Conference - Technical Presentations Now Available

Tuesday October 10th 2023 - Thursday October 12th 2023

2023 Conference Materials